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Pecvd System For Solar Cell Ar Coatings (Pecvd Lab-300)
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Pecvd System For Solar Cell Ar Coatings (Pecvd Lab-300)

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Key Features

Our range of PECVD System for Solar Cell AR Coatings (PECVD Lab-300) are available at following Features :-
Capacitively-Coupled PECVD system with loadlock chamber for R&D and small scale production.
Automatic loadlock system with cassette.
Uniform gas distribution through shower head.

Specifications
Substrate temperature uniformity : a A 2A C @400A C within 6"
Thickness uniformity of deposited layers : Cycle time : <15mins
Average throughput : Up to 21,600 wafers per year
Dimension : 1,730L A 1,027H A 1,832W (mm3)
Power : AC 2kW (13.56MHz) VHF & MF Power compatible
Gas : NF3/O2/H2/SiH4/N2/NH3/N2O/Ar
Substrate material : Si wafer
Pump : Dry(1,200l/min & 200l/min) & turbo(600l/s)

Company Details

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Incheon, Incheon

Mr. Yoon Choi

Address

175-25 Cheongcheon-Dong 2, Bupyeong-Gu, Incheon, Incheon, 403-853, Korea South

Industrial Automation in Incheon

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