Aluminum Sputtering Target By China Material Technology Co., Ltd.

We are instrumental in providing to our valuable customers excellent quality Aluminum Sputtering Target which is available with following specification:-
Metal : Aluminum(AL)
Density : 2.7g/cm3
Melting point : 660.37a
Boiling point : 2327a
Atomic number : 13
Purity : 99.9% , 99.99%, 99.999%, 99.9999%
Color : Silvery white
Tolerance : +/-0.2mm
CAS : 7429-90-5
Size : Size 01: diameter 1 mm
(wafer / round table / rod)
Size 02: length 1mm rectangular / sheet / step-like (splicing)
Size 03: outer diameter 1mm wall degree> 1 mm length> 1 mm (pipe / ring / rotatable targets)
Size 04:be customized according to user needs, sample processing, to map processing
Grain size : Uniform
Production process : Vacuum levitation melting, casting into ingots, thermo-mechanical treatment and precision machining
Applicable instrumentsVarious models magnetron sputtering equipment, etc.
Shape : Rotundity/rectangle/pieces/rod/ring /revolving targets/by drawing
Product uses : Industrial-grade coating, experiments or research level Mg target, electronics, optoelectronics, military, decorative, functional film
Packing vacuum : Packaging / vacuum neutral packing / special packaging outside reinforcement package
Origin : Nanchang Jiangxi
Brand : MAT-CN

Clients can avail this Aluminum Sputtering Target at industry leading prices from us.